Nano-Lithography

Nano-Lithography

Edited by

Stefan Landis, CEA-LETI-Minatec, Grenoble, France


ISBN : 9781848212114

Publication Date : January 2011

Hardcover 352 pp

137.00 USD

Co-publisher

Description


Lithography is an extremely complex tool – based on the concept of “imprinting” an original template version onto mass output – originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams – in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics, chemistry, mechanics and fluidics, and are now developing the nanoworld with new tools and technologies. Beyond the scientific challenges that are endemic in this miniaturization race, next generation lithography techniques are essential for creating new devices, new functionalities and exploring new application fields.

Nanolithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures - meaning the creation of patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. It is used in the fabrication of leading-edge semiconductor integrated circuits (nanocircuitry) or nanoelectromechanical systems (NEMS).

This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography.

It is written for engineers or researchers new to the field, and will help readers to expand their knowledge of technologies that are constantly evolving.

Contents


1. X-ray Lithography: Fundamentals and Applications, Massimo Tormen, Gianluca Grenci, Benedetta Marmiroli and Filippo Romanato.
2. NanoImprint Lithography, Stefan Landis
3. Lithography Techniques Using Scanning Probe Microscopy, Vincent Bouchiat.
4. Lithography and Manipulation Based on the Optical Properties of Metal Nanostructures, Renaud Bachelot and Marianne Consonni.
5. Patterning with Self-Assembling Block Copolymers, Karim Aissou, Martin Kogelschatz, Claire Agraffeil, Alina Pascale and Thierry Baron.
6. Metrology for Lithography, Johann Foucher and Jérôme Hazart.

About the authors


Stefan Landis works at CEA-LETI-Minatec in Grenoble, France. He also gives lectures on next generation lithography in many engineering schools in France and also in CEI-Europe Advanced Technology Education.